Arulmigu Meenakshi Amman college of Engineering
Vadamavandal-604410.
Prepared by,
V.Umapathy,
Prof./Mech.
Important Questions and Answers
MF25202-Thin Film Technology
Syllabus
1. Introduction to Thin Films and Vacuum Technology
Definition of thin films - Formation of thin films (sticking coefficient, formation of
thermodynamically stable cluster - nucleation) - Environment (Gas phase and plasma) for thin
film deposition; Deposition parameters and their effects on film growth, Substrates – overview
of various substrates utilized - Concept of different vacuum pumps: rotary, diffusion, Turbo
molecular pump, Cryogenic-pump, Ti-sublimation pump, Concept of different gauges: Pirani,
penning, Pressure Control – Mass flow controllers.
2. Physical Vapour Deposition (PVD) Techniques
Evaporation- Thermal evaporation, Electron beam evaporation; Laser ablation; Ion beam
evaporation and Cathodic arc deposition, Molecular Beam Epitaxy. Glow discharge
Sputtering- DC and RF Sputtering; Magnetron sputtering; Ion beam sputtering – Reactive
sputtering. Nucleation and growth of thin films (qualitative study only): Four stages of film
growth.
3. Chemical Vapour Deposition (CVD) Techniques
Advantages and disadvantages of Chemical vapour deposition (CVD) techniques over PVD
techniques, Different kinds of CVD techniques: Metallo Organic (MO) CVD, thermally
activated CVD, Plasma enhanced CVD, Atomic layer deposition (ALD)- Importance of ALD
technique. Epitaxy – Introduction: Epitaxial growth- Growth kinetics of epitaxy, Growth
modes – illustration of crystallographic relations with thin film to substrate, characterization
of epilayers (in situ and ex situ)
4. Deposition Monitoring, Control and Properties of Thin Film
, Microbalance, Crystal oscillator thickness monitor, optical monitor, Resistance Monitor.
Thickness measurement: Multiple Beam Interferometer, Fizeau (Tolansky) technique -
Fringes of equal chromatic order (FECO) method - Ellipsometry (qualitative only). Sheet
resistance - size effect - Electrical conduction in thin metallic films. Effect of Ageing and
Annealing - Oxidation - agglomeration. Dielectric properties: DC conduction mechanism -
Low field and high field conduction. Breakdown mechanism in dielectric films - AC
conduction mechanism. Temperature dependence of conductivity. Optical properties: Optical
constants and their determination - Spectrophotometer method. Page 25 of 79 Anti-reflection
coatings. Interference filters. Thin film Solar Cells CuInSe2 solar cell
5. Application of Thin Films
Thin film resistors: Materials and Design of thin film resistors (Choice of resistor and shape
and area) - Trimming of thin film resistors - sheet resistance control - Individual resistor
trimming. Thin film capacitors: Materials - Capacitor structures - Capacitor yield and capacitor
stability. Thin film field effect transistors: Fabrication and characteristics - thin film diodes.
S.No. Description
Unit-I
Introduction to Thin Films and Vacuum Technology
Introduction
,
, Basic Concepts
Vadamavandal-604410.
Prepared by,
V.Umapathy,
Prof./Mech.
Important Questions and Answers
MF25202-Thin Film Technology
Syllabus
1. Introduction to Thin Films and Vacuum Technology
Definition of thin films - Formation of thin films (sticking coefficient, formation of
thermodynamically stable cluster - nucleation) - Environment (Gas phase and plasma) for thin
film deposition; Deposition parameters and their effects on film growth, Substrates – overview
of various substrates utilized - Concept of different vacuum pumps: rotary, diffusion, Turbo
molecular pump, Cryogenic-pump, Ti-sublimation pump, Concept of different gauges: Pirani,
penning, Pressure Control – Mass flow controllers.
2. Physical Vapour Deposition (PVD) Techniques
Evaporation- Thermal evaporation, Electron beam evaporation; Laser ablation; Ion beam
evaporation and Cathodic arc deposition, Molecular Beam Epitaxy. Glow discharge
Sputtering- DC and RF Sputtering; Magnetron sputtering; Ion beam sputtering – Reactive
sputtering. Nucleation and growth of thin films (qualitative study only): Four stages of film
growth.
3. Chemical Vapour Deposition (CVD) Techniques
Advantages and disadvantages of Chemical vapour deposition (CVD) techniques over PVD
techniques, Different kinds of CVD techniques: Metallo Organic (MO) CVD, thermally
activated CVD, Plasma enhanced CVD, Atomic layer deposition (ALD)- Importance of ALD
technique. Epitaxy – Introduction: Epitaxial growth- Growth kinetics of epitaxy, Growth
modes – illustration of crystallographic relations with thin film to substrate, characterization
of epilayers (in situ and ex situ)
4. Deposition Monitoring, Control and Properties of Thin Film
, Microbalance, Crystal oscillator thickness monitor, optical monitor, Resistance Monitor.
Thickness measurement: Multiple Beam Interferometer, Fizeau (Tolansky) technique -
Fringes of equal chromatic order (FECO) method - Ellipsometry (qualitative only). Sheet
resistance - size effect - Electrical conduction in thin metallic films. Effect of Ageing and
Annealing - Oxidation - agglomeration. Dielectric properties: DC conduction mechanism -
Low field and high field conduction. Breakdown mechanism in dielectric films - AC
conduction mechanism. Temperature dependence of conductivity. Optical properties: Optical
constants and their determination - Spectrophotometer method. Page 25 of 79 Anti-reflection
coatings. Interference filters. Thin film Solar Cells CuInSe2 solar cell
5. Application of Thin Films
Thin film resistors: Materials and Design of thin film resistors (Choice of resistor and shape
and area) - Trimming of thin film resistors - sheet resistance control - Individual resistor
trimming. Thin film capacitors: Materials - Capacitor structures - Capacitor yield and capacitor
stability. Thin film field effect transistors: Fabrication and characteristics - thin film diodes.
S.No. Description
Unit-I
Introduction to Thin Films and Vacuum Technology
Introduction
,
, Basic Concepts
